Al/Ag/Al薄膜,Al/Ag/Al thin film
1)Al/Ag/Al thin filmAl/Ag/Al薄膜
2)Al/Ag doping thin filmsAl/Ag掺杂薄膜
3)Al-DLC thin filmsAl-DLC薄膜
4)Kapton/Al filmKapton/Al薄膜
1.The ground simulation tests of proton irradiation forKapton/Al films were conducted using the space synthesis irradiating facility,in which the energy of protons was chosen as 90 keV, and the flux was 5.采用空间综合辐照设备对Kapton/Al薄膜进行了质子辐照地面模拟试验,选取质子能量90keV,辐照通量5。
5)Al filmAl薄膜
1.The results indicate that the reaction ofAl film with water and oxygen is finished in only 50 s, and the change rate is 24.本文在25℃、相对湿度50%的条件下,分别蒸镀了Al,Al/Se薄膜,研究了它们在空气中的导电性能,试验结果表明,只需50s,Al薄膜的氧化反应已基本完成,其电阻率变化率为24。
英文短句/例句
1.Joining of Al-Al Micron Foils by Ultrasonic Friction Welding微米厚Al-Al薄膜的超声摩擦焊接技术
2.Study of Si-based Ferroelectric Capacitors with Ni-Al Film;含Ni-Al薄膜的硅基铁电电容器研究
3.MULTISCALE SIMULATION OF NANOINDENTATION ON Al THIN FILMAl薄膜纳米压痕过程的多尺度模拟
4.Oxidation Resistance and Electric Conduction of Novel Al/Ag/Al Thin Film ElectrodeAl/Ag/Al复合薄膜电极的抗氧化性和电性能研究
5.Luminescence Properties of ZnO and V/ Al-doped ZnO Thin Films;ZnO及V、Al掺杂ZnO薄膜的发光性能研究
6.Deposition of (Ti,Al)N Films by Filtered Cathodic Vacuum Arc;FCVA沉积（Ti，Al）N薄膜的工艺研究
7.Study on the Preparation and Optical and Electrical Properties of Al-doped ZnO Thin Films;Al掺杂ZnO薄膜的制备与光电性质研究
8.Electrical Transport Properties of Al Doped ZnO Thin FilmsAl掺杂的ZnO薄膜的电输运性质
9.Preparation of Mg and Al co-doped ZnO thin films with tunable band gap带隙可调的Al,Mg掺杂ZnO薄膜的制备
10.RESEARCH ON ELECTROCHROMIC PROPERTIES OF Al_2O_3/ B-Al-NiO-BASED FILMAl_2O_3/B-Al-NiO薄膜电致变色性能的研究
11.EFFECT OF Ti ON THE ANTI-CORROSION PROPERTY OF Zn-Al ALLOY FILMSTi对Zn-Al合金薄膜耐腐蚀性能的影响
12.Cu(Al)/SiO_2 Laminated Film and Micro-characteristicCu(Al)/SiO_2复合薄膜及显微特征
13.Surface Topography and Optical Properties of Al-doped ZnO Thin Films by Sol-gel ProcessAl掺杂ZnO薄膜的表面形貌和光学性质
14.Research Progress of Al-Cu-Fe Quasicrystalline Films/CoatingsAl-Cu-Fe准晶薄膜/涂层的研究进展
15.Preparation of Pure and Al-doped ZnO Films by RF Magnetron Sputtering and Study of Their Properties;ZnO薄膜和Al掺杂ZnO（ZAO）薄膜的射频磁控溅射制备及其性能研究
16.Study on the Optical Properties of Ultrathin Al Films and AlN Thin Films and Related Problems;超薄Al膜和AlN薄膜的光学性质及相关问题的研究
17.Study on Mechanical Properties and Micro Structure of (Ti, Al) N Coatings;（Ti，Al）N薄膜力学性能及微观组织结构的研究
18.The Study of Fabrication and Properties of p-type ZnO:(Al,N,H) Thin Film;p型导电ZnO：（Al，N，H）薄膜的制备及性能研究
相关短句/例句
Al/Ag doping thin filmsAl/Ag掺杂薄膜
3)Al-DLC thin filmsAl-DLC薄膜
4)Kapton/Al filmKapton/Al薄膜
1.The ground simulation tests of proton irradiation forKapton/Al films were conducted using the space synthesis irradiating facility,in which the energy of protons was chosen as 90 keV, and the flux was 5.采用空间综合辐照设备对Kapton/Al薄膜进行了质子辐照地面模拟试验,选取质子能量90keV,辐照通量5。
5)Al filmAl薄膜
1.The results indicate that the reaction ofAl film with water and oxygen is finished in only 50 s, and the change rate is 24.本文在25℃、相对湿度50%的条件下,分别蒸镀了Al,Al/Se薄膜,研究了它们在空气中的导电性能,试验结果表明,只需50s,Al薄膜的氧化反应已基本完成,其电阻率变化率为24。
6)ultrathin aluminium film超薄Al膜
1.The relationship between absorptance and thickness ofultrathin aluminium film in visible,IR region indicate that the absorptance of the metal films has size effect.超薄Al膜吸收率随薄膜厚度变化的关系表明 :金属薄膜吸收率具有尺寸效应 ,并具有极大值。
延伸阅读
Al元素符号： al 英文名： aluminum 中文名： 铝相对原子质量： 26.9815 常见化合价： +3 电负性： 1.61外围电子排布： 3s2 3p1 核外电子排布： 2,8,3同位素及放射线：al-26[730000y] *al-27 al-28[2.3m]电子亲合和能： 48 kj·mol-1第一电离能： 577.6 kj·mol-1 第二电离能： 1817 kj·mol-1 第三电离能： 2745 kj·mol-1单质密度： 2.702 g/cm3 单质熔点： 660.37 ℃ 单质沸点： 2467 ℃原子半径： 1.82 埃 离子半径： 0.51(+3) 埃 共价半径： 1.18 埃常见化合物： al2o3 alcl3 al2s3 naalo2 al2(so4)3 al(oh)3发现人： 厄斯泰德、维勒 时间： 1825 地点： 丹麦名称由来：拉丁文：alumen， aluminis（铝）。元素描述：柔软轻质的银白色金属，在地壳中含量第三。元素来源：自然界完全没有铝单质存在。可以电解铝土(al2o3)制取铝。元素用途：上自飞机下到易拉罐应用广泛。因为纯铝太柔软，所以要加入不到1%的硅或铁以加大其硬度和强度。
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